Byron
You may wish to have some means of "monitoring" resist thickness
As well as listing the material layer beneath the resist, and the ebeam
voltage condition.
...with the potential backscattering of the electron beam, especially from a
heavy metal layer beneath, some people may find major variations in the
"exposure" conditions
(in addition to the variables you have listed)
..ideally the spin-on will give the same thickness on all users' samples,
but a monitor of it may show some differences.
W
on 6/11/02 1:28 PM, Byron Gates at bgates(a)gmwgroup.harvard.edu wrote:
Dear Raith Users,
I agree with Heather, we should compile a database of information on each
photoresist that we are currently using in the Raith. A suggestion for the
organization of the data is to utilize the capabilities of Excel. Multiple
windows can be established, each corresponding to a different photoresist.
On each page we would compile lists of spin speeds, bake conditions, and
e-beam exposures that have worked for different ranges of feature sizes.
Initially we could have users put their e-mail contact next to the data
they compile so other users can ask for more details if necessary.
Regards,
Byron
Byron Gates
Harvard University
Department of Chemistry and Chemical Biology
12 Oxford Street
Cambridge, MA 02138
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