Dear Raith Users,
I agree with Heather, we should compile a database of information on each
photoresist that we are currently using in the Raith. A suggestion for the
organization of the data is to utilize the capabilities of Excel. Multiple
windows can be established, each corresponding to a different photoresist.
On each page we would compile lists of spin speeds, bake conditions, and
e-beam exposures that have worked for different ranges of feature sizes.
Initially we could have users put their e-mail contact next to the data
they compile so other users can ask for more details if necessary.
Regards,
Byron
Byron Gates
Harvard University
Department of Chemistry and Chemical Biology
12 Oxford Street
Cambridge, MA 02138
